The VTM crystal growth furnace is a new type of single crystal process equipment designed based on our company's independently developed VTM process method. The equipment consists of four parts: heating system, motion system support mechanism, and electrical control system. lt is suitable for single crystal growth of various compound semiconductive materials such as tellurium zinc cadmium, cadmium telluride, gallium antimonide, etc.
VTM Crystal Growth Furnace
Technical Parameters
No. | Product Parameters | Technical Indicators |
1 | Applicable furnace body range | 2-6 inches |
2 | Furnace structure | Vertical single tube shape |
3 | control mode | Microcontroller |
4 | Ultimate working temperature of furnace body | 1350 ℃ |
5 | Temperature display accuracy | 0.1 ℃ |
6 | emperature control accuracy | Better than + 0.2 |
7 | Furnace body action mode | Vertical lifting/left and right rotation |
8 | Furnace lifting stroke | L effective=620mm |
Characteristics
- The introduction of magnetic control at the crystal growth interface stabilizes the direction of crystal growth andimproves the yield of single crystal products;
- The mechanical movement and heating system of the entire machine are controlled by PC, with menu data inputand historical data query. lt has sound and light alarms and high production repeatability;
- The heating system is divided into main heating device and auxiliary heating device. The main heating controls theoverall temperature. Auxiliary heating is movable. Realizing high-precision local heating enhances the controllabili.ty of the temperature field;
- The sports system adopts one click control, lt not only meets the rapid liftina during furnace loading, but alsoaccurately controls the slow travel speed of the furnace body during crystal growth, greatly improving productionefficiency;
- The supporting mechanism adopts a split design, ensuring stability while effectively blocking vibration, improvingthe quality and yield of single crystal growth;
Adopting a rigid transmission mechanism, the transmission efficiency is high and the stability is strong.
Widely used in aerospace, nuclear industry, medical imaging, industrial radiography, and related fields.
Application Fields
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