Vacuum Carbon Plating Furnace | Heat Treatment Equipment

Mainly used in the growth process of semiconductor crystalmaterials, carbon plating treatment on the inner wall of quartzcrucibles can effectively block the reaction between high-tem-perature solution and quartz crucibles, which is conducive tothe production of complete and high-quality single crystals.

Characteristics of Vacuum Carbon Plating Furnace
- Fully automatic control, multi-stage temperature zone heating;

- High temperature control accuracy and good film uniformity;

- Suitable for various sizes of ampoules.

Vacuum Carbon Plating Furnace

Technical Parameters

No.	Product Parameters	Technical Indicators
1	Equipment structure	Horizontal/vertical tubular heating furnace
2	Heating furnace	The heating furnace adopts a multi-stage heating form, and each group canbe individually controlled for heating. The maximum temperature is 1100 °C and the control accuracy is better than ± 0.3%
3	Pipeline heating	Wrap heating clothes around the outside of the pipeline; The valve body iswrapped with a heating jacket, and the pipeline control accuracy is ± 2%
4	Automatic program	One click start of equipment (vacuum pumping, pipeline heating), air intake, canedit multiple temperature curve programs, and automatically complete operations according to the process
4	Automatic program	Equipped with over temperature alarm, machine abnormality and water shortage alarm functions
5	Flow control	All metal flow control valve
6	Cold trap system	Low temperature cold trap
7	Control mode	PLC+touch screen fully automatic control (except for workpiece valves)
8	Alarm and protection system	A comprehensive logic program interlocking and protection system, which alarmsand executes corresponding protection measures for abnormal situations such aspumps, water shortages, overcurrent and overvoltage, and circuit breakers.

Critical for military, aerospace, meteorology, astronomical observation, railway safety, and search & rescue operations.

Application Fields

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