PS-300M2 high vacuumresistance evaporation coating machine is equipped with two sets of evaporation sources (filamentous source and boat source can be used), compatible with metal and organic material evaporation (organic material evaporation using a combination of tungsten basket and crucible evaporation source). The integrated design of themain engine and the control of the equipment makes the operation convenient, the structure is compact and the area issmall. lt can be used to prepare metal film, organic film and sample preparation by SEM. This series of equipment is widely used in the teaching and research experiments of universities and scientific research institutes, as well as in the exploration experiments and the development of new products.
Resistance Evaporation Coater
Technical Parameters
No. | Product Parameters | Technical Indicators |
1 | Vacuum Chamber | Glass bell jar + stainless steel base,Ф300xH360mm. |
2 | Vacuum system | Turbomolecular pump + direct-linked rotary vane pump quasi-oil-free vacuumsystem, electromagnetic front valve, "one low one high" digital display compos.ite vacuum gauge. |
3 | Vacuum limit | Better than 2.0x10-4 Pa. |
4 | Speed | Pumped from the atmosphere to 9.0x10-4Pa≤30min. |
5 | Size of base plate table | Maximum plating substrate size/area: 100x100mm; Pull-out substrate, easy toinstall card substrate. |
6 | Control mode | Manual button control. |
7 | Alarm and protection | Alarm pump, electrode and other abnormal situations such as water shortageover and over voltage,break and implement corresponding protectivemeasures.Perfect logic program interlock protection system. |
Critical for military, aerospace, meteorology, astronomical observation, railway safety, and search & rescue operations.
Application Fields
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