CK500 high vacuum multi-target magnetron sputtering coater is mainly composed of coating chamber (Ф500xH430MM), permanent magneticcircular flat target, vacuum system, rotary heating substrate platform, gaspath system, electrical control and alarm protection system, etc. . CK500 high vacuum multi-target magnetron sputtering coater mainly consists of vacuum special stainless steel chamber, four 3-inch round planar magnetron targets, one DC and one RF sputtering power supply. Mechanical Pump + molecular pump high vacuum system, rotating, heating substrate table (room tempera-ture to 300 ±1°C adjustable and controllable), frame, gas, water logicbutton control and safety protection, etc. . The equipment can be equipped with four-target co-sputtering function to achieve a multi-purpose, nano-lev-el single or multi-layer conductive film, metal film, semiconductor film, insulation film. The whole machine has the advantages of compact structure,small footprint, convenient operation and fast vacuum pumping speed.
