VGF Crystal Growth Furnace | Heat Treatment Equipment

VGF Crystal Growth Furnace is mainly used forgrowth of Compound semiconductor mate-rials such as gaas, gaas and GE.

Characteristics of VGF Crystal Growth Furnace:
- Ten years experience in furnace body production technologylong life, stable temperature field.

- Self-development of the third generation of automatic liftingsystem for long crystal stability to enhance protection.

- High Precision Temperature control system, improve the rateof finished products.
- Super Safety Protection and alarm device.

VGF Crystal Growth Furnace

Technical Parameters

No.	Product Parameters	Technical Indicators
1	Furnace body structure.	vertical
2	Type of furnace body	Atmospheric pressure
3	Applicable size	2-6 inches (customizable)
4	Number of heating zones	Generally, it is a 6-stagetemperature control(customizable)
5	Control mode.	Microcontroller
6	Extreme operating temperature	1280℃C
7	Movement speed range	≥0.05mm/hour
8	Range of constant temperature zone	>200mm
9	Continuous working hours	>720 hours
10	Temperature display accuracy	0.1 ℃
11	Temp Accuracy	Better than ± 0.2 °C

Critical for military, aerospace, meteorology, astronomical observation, railway safety, and search & rescue operations.

Application Fields

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